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8 个月
利用Sn(dmamp)2和H2O2原子层沉积导电SnO2薄膜及其在模板化金红石TiO2生长 ...
本研究针对传统SnO2薄膜沉积工艺存在的低生长速率、高杂质含量及高温结晶难题,采用Sn(dmamp)2和H2O2的原子层沉积(ALD)技术,实现了高纯度、低电阻率SnO2薄膜的低温制备(200℃),生长速率达0.11-0.15 nm/cycle,并成功将其作为模板诱导金红石TiO2生长,使MIM电容器介 ...
EurekAlert!
3 年
Figure 2. Passivation mechanism of perovskite devices with ligand-tailored SnO2 QDs. (IMAGE)
Credit must be given to the creator.
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