SAN FRANCISCO — Amid probable delays for extreme ultraviolet (EUV) lithography, ASML, Canon and Nikon are updating their roadmaps, racing each other to capitalize on the shift towards ...

Applied Materials, Inc. (AMAT), a semiconductor equipment manufacturer (“semi cap”), announced Centura Sculpta last week. According to the company, this tool will help semiconductor manufacturers ...

With continuous device scaling, process windows have become narrower and narrower due to smaller feature sizes and greater process step variability [1]. A key task during the R&D stage of ...

If a lot of the buzz at SPIE last week came from the packed sessions on EUV technology, a lot of the serious note-taking was done at the papers on double-patterning. Not least among the sources of ...

SAN JOSE, Calif., Feb. 26, 2024 (GLOBE NEWSWIRE) -- Today at the SPIE Advanced Lithography + Patterning conference, Applied Materials, Inc. introduced a portfolio of products and solutions designed to ...