Video: Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
8:23
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jove.com
Video: Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
7.5K Views. Federal University of São Carlos (UFSCAR). In the reactive sputter technique it's possible to have a fine control of the parameters which allows to deposit niobium oxide fume with different stochiometer and preference. The main advantage of this technique is the deposition of homogenous fumes with good adhesion over large areas and ...
7.6K viewsSep 28, 2019
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Sputtering Deposition: A Complete Guide To Method - VacCoat
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SOLVED: For the metallization process of the Al electrode in FET, magnetron sputtering was employed. During the sputtering process, plasma was developed between the target and substrate. Estimate the thermal energy of the Al particles that were sputtered and transferred to the substrates. Consider the following conditions: - The distance between the target and substrate is around 20 cm.- The momentum energy can be transferred by the kinematic factor, and all velocities of particles in the vacuum
SOLVED: For the metallization process of the Al electrode in FET, magnetron sputtering was employed. During the sputtering process, plasma was developed between the target and substrate. Estimate the thermal energy of the Al particles that were sputtered and transferred to the substrates. Consider the following conditions: - The distance between the target and substrate is around 20 cm.- The momentum energy can be transferred by the kinematic factor, and all velocities of particles in the vacuum
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Feb 12, 2023
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